These are electron optical instruments designed for fast in-line automated defect review and yield management of wafer fabrication. They often have an on-line coordinate link with a defect or dust inspection system and to ADR and ADC systems (automated defect reviewer or automated defect classification systems) possible to integrate witn EDX analysis.

	JWS-2000 Defect review tool
	Specifications Resolution: 5 nm at 1 kV Acc. Voltage: 0.5 to 15 kV Stage: 150/200 mm wafer Tilt: -15º to 60º
	JWS-7855S Mask review tool
	Specifications Resolution: 5 nm at 1 kV Acc. Voltage: 0.5 to 15 kV Stage: 200 mm wafer Tilt: -15º to 60º
	JWS-8755S Wafer inspection system
	Specifications Resolution: 5 nm at 1 kV Acc. Voltage: 0.5 to 15 kV Stage: 300 mm wafer Tilt: -15º to 60º