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X-ray photon spectroscopy (XPS) | |||||||||||||||||||||||||||||||||||||||||||||||||||
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X-Ray Photoelectron Spectroscopy (XPS or ESCA) is a surface analytical technique that detects the photoelectrons with characteristic energies that are emitted from a sample when X-rays irradiate it. Since the photoelectrons have low energies (0-1500eV), then only those originating from the top few atomic layers of the sample can escape without being inelastically scattered, hence the surface sensitivity of the method. The principal strength of XPS is that peak shifts can reveal the chemical environment of the surface species. A high resolution spectrometer, combined with easy to use Windows™ curve fitting software mean that chemical information may be readily obtained. The JEOL instruments are particularly suited for industrial applications, since the familiar graphical user interface and high degree of mechanical automation (vacuum system, sample stage, ion etching system), make setting up multiple experiments on multiple samples simple. Indeed the system philosophy is that "routine" analyses can be set up for unattended operation. The JPS-9200 has a new input lens system with a magnetic and electrostatic lens to achieve high sensitivity measurements from small areas. More reading>> JEOL offers the JPS-9010 series with or without a monochromator, but when one is fitted the instrument is configured so that Total Reflection XPS (TRXPS) can be used for significantly enhanced sensitivity for surface species.
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